Physics of high-jc Nb/AlOx/Nb Josephson junctions and prospects of their applications

被引:7
|
作者
Naveh, Y [1 ]
Averin, DV
Likharev, KK
机构
[1] IBM Corp, Haifa, Israel
[2] SUNY Stony Brook, Dept Phys & Astron, Stony Brook, NY 11794 USA
关键词
Josephson junctions; superconductor digital electronics; RSFQ logic; resonant tunneling; transport in disordered systems;
D O I
10.1109/77.919529
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
At critical current density of the order of 100 kA/cm(2), tunnel Josephson junctions become overdamped and may be used in RSFQ circuits without external shunting, dramatically increasing circuit density. However, the physics of electron transport in such high-j(c) junctions differs from the usual direct tunneling and until recently remained unclear. We have found that the observed de I-V curves of niobium-trilayer junctions with j(c) = 210 kA/cm(2) can be explained quantitatively by resonant tunneling through strongly disordered barriers. According to this interpretation, random spread of critical current in high-j(c) junctions may be rather small (below 1% r.m.s.) even in deep-submicron junctions, making VLSI RSFQ circuits, with density above 10 MJJ/cm(2), feasible.
引用
收藏
页码:1056 / 1060
页数:5
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