Effects of plasma parameters on the properties of La1-xSrxMnO3 thin layers deposited in low-pressure RF plasma wave shock reactor

被引:4
|
作者
Nikravech, M [1 ]
Rousseau, F [1 ]
Morvan, D [1 ]
Amouroux, J [1 ]
机构
[1] Univ Paris 06, Ecole Natl Super Chim, Lab Genie Procedes Plasmas & Traitement Surfaces, F-75005 Paris, France
来源
HIGH TEMPERATURE MATERIAL PROCESSES | 2003年 / 7卷 / 02期
关键词
low pressure plasma; SOFC; fuel cell; cathode;
D O I
10.1615/HighTempMatProc.v7.i2.120
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Deposits of La1-xSrxMnO3+/-delta used as cathode materials in solid oxide fuel cells are obtained by oxidation of nitrate precursors in a low pressure RF plasma reactor equipped with a convergent nozzle. Impedance measurements showed the role of plasma parameters on the electrical conductivity of deposits. Infrared analysis of deposits permitted to measure the role of plasma parameters on the conversion rate of nitrate precursors. Oxygen and hydroxyl radicals produced by plasma are found to be the major reactive species that lead to the oxidation of nitrate precursors in this process.
引用
收藏
页码:225 / 230
页数:6
相关论文
共 27 条
  • [1] Preferred-orientation effects on the ferromagnetic properties of La1-xSrxMnO3 films deposited on si substrates
    Chen, YH
    Lo, YS
    Wu, TB
    Chang, FC
    Chi, CC
    ELECTROCHEMICAL AND SOLID STATE LETTERS, 2006, 9 (03) : J9 - J12
  • [2] Low-pressure air plasma induced modification of structural and electrical properties of Gd1-xSrxMnO3 manganites
    Chettri, Pronita
    Nagaraja, B. S.
    Rao, Ashok
    Deka, Utpal
    RADIATION EFFECTS AND DEFECTS IN SOLIDS, 2021, 176 (11-12): : 1092 - 1106
  • [3] Effect of spray parameters on the electrical conductivity of plasma-sprayed La1-xSrxMnO3 coating for the cathode of SOFCs
    Li, CJ
    Li, CX
    Wang, M
    SURFACE & COATINGS TECHNOLOGY, 2005, 198 (1-3): : 278 - 282
  • [4] Growth, Microstructure and Properties of Epitaxial La1-xSrxMnO3 Thin Films on Various Substrates Using RF Magnetron Sputtering
    Fang, Y.
    Sakhalkar, V. R.
    He, J.
    Jiang, H. Q.
    Jiang, J. C.
    Meletis, E. I.
    JOURNAL OF NANO RESEARCH, 2011, 14 : 83 - 93
  • [5] Optical emission spectroscopy of a supersonic low-pressure plasma reactor used to synthesis SOFC cathodes thin layers
    Rousseau, F.
    Nikravech, M.
    Awamat, S.
    Morvan, D.
    Amouroux, J.
    HIGH TEMPERATURE MATERIAL PROCESSES, 2006, 10 (03): : 431 - 444
  • [6] Effects of pressure on PbTiO3 thin film prepared by low-pressure thermal plasma deposition
    Nagata, Shingo
    Wakiya, Naoki
    Shinozaki, Kazuo
    Masuda, Yoshio
    Mizutani, Nobuyasu
    Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals, 1999, 63 (01): : 62 - 67
  • [7] Effects of pressure on PbTiO3 thin film prepared by low-pressure thermal plasma deposition
    Nagata, S
    Wakiya, N
    Shinozaki, K
    Masuda, Y
    Mizutani, N
    JOURNAL OF THE JAPAN INSTITUTE OF METALS, 1999, 63 (01) : 62 - 67
  • [8] The effects of process parameters on yield and properties of iron nanoparticles from ferrocene in a low-pressure plasma
    Panchal, V.
    Lahoti, G.
    Bhandarkar, U.
    Neergat, M.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2011, 44 (34)
  • [9] Effects of film thickness on surface flatness and physical properties in La1-xSrxMnO3 thin films investigated by scanning tunneling microscopy
    Okawa, N
    Tanaka, H
    Akiyama, R
    Matsumoto, T
    Kawai, T
    SOLID STATE COMMUNICATIONS, 2000, 114 (11) : 601 - 605
  • [10] Effects of plasma power and deposition pressure on the properties of the low dielectric constant plasma polymerized cyclohexane thin films deposited by plasma enhanced chemical vapor deposition
    Shim, C
    Yang, J
    Quan, YC
    Choi, J
    Jung, D
    JOURNAL DE PHYSIQUE IV, 2001, 11 (PR3): : 795 - 802