Evaluation of different deposition conditions on thin films deposited by electrostatic spray deposition using a uniformity test

被引：14

作者：

Roncallo, S. ^{[1
]}

Painter, J. D. ^{[1
]}

Ritchie, S. A. ^{[2
]}

Cousins, M. A. ^{[1
]}

Finnis, M. V. ^{[2
]}

Rogers, K. D. ^{[3
]}

机构：

[1] Cranfield Univ, Ctr Mat Sci & Engn, CDS, Swindon SN6 8LA, Wilts, England

[2] Cranfield Univ, Dept Engn Syst & Management, CDS, Swindon SN6 8LA, Wilts, England

[3] Cranfield Univ, Cranfield MK43 0AL, Beds, England

来源：

THIN SOLID FILMS | 2010年 / 518卷 / 17期

基金：

英国工程与自然科学研究理事会;

关键词：

Copper indium sulphide; Electrostatic spray deposition; Uniformity; Solar cells; Velocimetry; Thin films; OPTICAL-PROPERTIES; CUINS2; PARAMETERS;

D O I：

10.1016/j.tsf.2010.01.061

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Copper indium disulphide films were produced by electrostatic spray deposition using a water/alcohol solution of copper chloride (CuCl2), indium chloride (InCl3) and thiourea (CS(NH2)(2)) sprayed onto SnO2:F coated glass substrates. The influence of various deposition parameters, namely substrate temperature (380-450 degrees C), applied voltage (12-18 kV), solution concentration (0.21-0.49 M), flow rate (25-200 mu l/min) and needle-substrate distance (40-70 mm) were investigated, particle image velocimetry measurements were made of the spray cone and correlated with the film uniformity. The film uniformity was measured using an optically based test developed in-house. Results show that the highest concentrated spray solution and lowest deposition temperature produce non-uniform films. In contrast, a needle-substrate distance of 50 mm, and the lowest applied voltage and flow rate resulted in the most uniform films. (C) 2010 Elsevier B.V. All rights reserved.

引用

页码：4821 / 4827

页数：7

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