Effect of thermal diffuse scattering in triple-crystal diffractometry with high-energy synchrotron radiation

被引：4
|
作者：
Schmidt, T
Woo, D
Keitel, S
Schneider, JR
Lambert, U
Zulehner, W
机构：
[1] DESY, Hasylab, D-22603 Hamburg, Germany
[2] Wacker Siltron AG, D-84479 Burghausen, Germany
来源：
JOURNAL OF APPLIED CRYSTALLOGRAPHY | 1998年 / 31卷 / pt 4期
关键词：
D O I：
10.1107/S0021889898002684
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
The thermal diffuse scattering around reflection 220 of a thick, perfect silicon crystal has been studied quantitatively by means of a triple-crystal diffractometer and 100 keV synchrotron radiation. The necessary fitting procedures were simplified by deriving an analytic solution to the instrumental resolution function for nondispersive setting of three perfect crystals. The temperature and q dependence of the thermal diffuse scattering are very well described, taking only acoustical phonons into account; the contribution of optical phonons has been calculated explicitly.
引用
收藏
页码：625 / 633
页数：9
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