Influence of substrate thickness on plasma resonance in a semiconductor heterostructure with a two-dimensional electron gas

被引：1
|
作者：
Popov, VV [1 ]
Tsymbalov, GM [1 ]
机构：
[1] Russian Acad Sci, Inst Radio Engn & Elect, Saratov Branch, Saratov, Russia
来源：
TECHNICAL PHYSICS LETTERS | 1998年 / 24卷 / 05期
基金：
俄罗斯基础研究基金会;
关键词：
D O I：
10.1134/1.1262122
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
A strict electrodynamic approach is used to analyze the excitation of oscillations of a two-dimensional electron plasma by an external plane electromagnetic wave in a semiconductor heterostructure with a grating coupling element. An analysis is made of the influence of the substrate thickness on the resonance magnitude and the profile of the resonance curve. (C) 1998 American Institute of Physics. [S1063-7850(98)01305-6].
引用
收藏
页码：361 / 362
页数：2
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