Size-Dependent Localized Phonon Population in Semiconducting Si Nanowires
被引:9
|
作者:
Patsha, Avinash
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机构:
HBNI, Surface & Nanosci Div, Indira Gandhi Ctr Atom Res, Kalpakkam 603102, Tamil Nadu, India
Tel Aviv Univ, Dept Mat Sci & Engn, Tel Aviv, IsraelHBNI, Surface & Nanosci Div, Indira Gandhi Ctr Atom Res, Kalpakkam 603102, Tamil Nadu, India
Patsha, Avinash
[1
,2
]
Dhara, Sandip
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机构:
HBNI, Surface & Nanosci Div, Indira Gandhi Ctr Atom Res, Kalpakkam 603102, Tamil Nadu, IndiaHBNI, Surface & Nanosci Div, Indira Gandhi Ctr Atom Res, Kalpakkam 603102, Tamil Nadu, India
Dhara, Sandip
[1
]
机构:
[1] HBNI, Surface & Nanosci Div, Indira Gandhi Ctr Atom Res, Kalpakkam 603102, Tamil Nadu, India
[2] Tel Aviv Univ, Dept Mat Sci & Engn, Tel Aviv, Israel
Si nanowires;
Phonon Population;
Raman spectroscopy;
size-dependent;
Kelvin probe force microscopy;
depletion layers;
RAMAN-SPECTROSCOPY;
SILICON;
SCATTERING;
CONFINEMENT;
DIFFUSION;
TRANSPORT;
SURFACES;
D O I:
10.1021/acs.nanolett.8b03300
中图分类号:
O6 [化学];
学科分类号:
0703 ;
摘要:
The optical phonons in semiconductor nanostructures play an indispensable role in fundamental phenomenon and device applications based on these nanostructures. We study the Raman spectroscopy of optical phonons in Si nanowires (NWs) whose sizes are beyond the phonon confinement regime. The peak shift and unusual asymmetric broadening by one phonon mode in Si NWs is observed during far-field Raman studies. Using an appropriate thermal anchoring and localized Raman measurements on single NWs by near-field tip-enhanced Raman spectroscopy (TERS), we demonstrate the decoupling of multiple origins responsible for the peak shift accompanied by asymmetric broadening of the one-phonon mode and the appearance of multiple phonon peaks from a single measurement area. A model based on the localized phonon population induced by NW size-dependent charge depletion is proposed to explain the observed dependence of phonon characteristics on NW size. The scanning Kelvin probe force microscopy measurements confirm the size-dependent intrinsic semiconductor surface and interface states-induced charge depletions in single Si NWs. The study clearly suggests the size-dependent phonon characteristics of Si NWs which are crucial for several NW-based photovoltaic and thermoelectric devices.
机构:
Georgia Inst Technol, George W Woodruff Sch Mech Engn, Atlanta, GA 30332 USAGeorgia Inst Technol, George W Woodruff Sch Mech Engn, Atlanta, GA 30332 USA
Vizoso, Daniel
Kosmidou, Maria
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机构:
Univ Kentucky, Dept Chem & Mat Engn, Lexington, KY 40506 USAGeorgia Inst Technol, George W Woodruff Sch Mech Engn, Atlanta, GA 30332 USA
Kosmidou, Maria
Balk, T. John
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机构:
Univ Kentucky, Dept Chem & Mat Engn, Lexington, KY 40506 USAGeorgia Inst Technol, George W Woodruff Sch Mech Engn, Atlanta, GA 30332 USA
Balk, T. John
Hattar, Khalid
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机构:
Sandia Natl Labs, Ctr Integrated Nanotechnol, POB 5800, Albuquerque, NM 87185 USAGeorgia Inst Technol, George W Woodruff Sch Mech Engn, Atlanta, GA 30332 USA
Hattar, Khalid
Deo, Chaitanya
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机构:
Georgia Inst Technol, George W Woodruff Sch Mech Engn, Atlanta, GA 30332 USA
Georgia Inst Technol, Sch Mat Sci & Engn, Atlanta, GA 30332 USAGeorgia Inst Technol, George W Woodruff Sch Mech Engn, Atlanta, GA 30332 USA
Deo, Chaitanya
Dingreville, Remi
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h-index: 0
机构:
Georgia Inst Technol, George W Woodruff Sch Mech Engn, Atlanta, GA 30332 USA
Sandia Natl Labs, Ctr Integrated Nanotechnol, POB 5800, Albuquerque, NM 87185 USAGeorgia Inst Technol, George W Woodruff Sch Mech Engn, Atlanta, GA 30332 USA