Consideration of low-frequency noise in MOSFET's for analog performance

被引:17
|
作者
Hu, C [1 ]
Li, GP [1 ]
Worley, E [1 ]
White, J [1 ]
机构
[1] UNIV CALIF IRVINE,DEPT ELECT & COMP ENGN,IRVINE,CA 92717
关键词
D O I
10.1109/55.545767
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Low-frequency noise characteristics of MOSFET's have been studied in terms of their dependence on metal interconnect perimeter length, device W/L ratio, and gate-biasing voltage, In contrast to the theoretical model, a noise intensity increasing with lowering gate biasing was observed, which suggests that a compromise between noise performance and gain/offset voltage needs to be carefully examined in analog circuit design, Low-frequency noise was also found to be dependent on W/L ratio in devices with the same gate area, which should be considered in future device scaling.
引用
收藏
页码:552 / 554
页数:3
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