Wavelength-dispersive total reflection X-ray fluorescence with high-brilliance undulator radiation at SPring-8

被引：17

作者：

Awaji, N

Ozaki, S

Nishino, J

Noguchi, S

Yamamoto, T

Syoji, T

Yamagami, M

Kobayashi, A

Hirai, Y

Shibata, M

Yamaguchi, K

Liu, KY

Kawado, S

Takahashi, M

Yasuami, S

Konomi, I

Kimura, S

Hirai, Y

Hasegawa, M

Komiya, S

Hirose, T

Okajima, T

机构：

[1] Matsushita Technores Inc, Moriguchi, Osaka 5708501, Japan

[2] Fujitsu Labs Ltd, Atsugi, Kanagawa 2430197, Japan

[3] Sanyo Elect Co Ltd, Microelect Res Ctr, Anpachi 5030195, Japan

[4] Cent Res Inst Elect Power Ind, Yokohama, Kanagawa 2400196, Japan

[5] Rigaku Corp, Xray Labs, Takatsuki, Osaka 5691146, Japan

[6] Kobe Steel Ltd, Nishi Ku, Kobe, Hyogo 6512271, Japan

[7] Kobelco Res Inst Inc, Nishi Ku, Kobe, Hyogo 6512271, Japan

[8] Sumitomo Elect Ind Ltd, Konohana Ku, Osaka 5540024, Japan

[9] Sumitomo Elect Ind Ltd, Itami, Hyogo 6640016, Japan

[10] Sony Corp, Tech Support Ctr, Hodogaya Ku, Yokohama, Kanagawa 2400036, Japan

[11] Toyota Cent Res & Dev Labs Inc, Aichi 4801192, Japan

[12] NEC Corp Ltd, Syst Devices & Fundamental Res, Tsukuba, Ibaraki 3058501, Japan

[13] Hitachi Ltd, Adv Res Lab, Kawagoe, Saitama 3500395, Japan

[14] Fujielect Corp R&D Ltd, Yokosuka, Kanagawa 2400194, Japan

[15] Mitsubishi Elect Corp, Adv Technol R&D Ctr, Amagasaki, Hyogo 6618661, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 2000年 / 39卷 / 12A期

关键词：

TXRF; XRF; SR; SPring-8; undulator; trace element; contamination;

D O I：

10.1143/JJAP.39.L1252

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Wavelength-dispersive total reflection X-ray fluorescence (WD-TXRF) equipment supported by an energy-dispersive (ED) solid-state detector (SSD) has been developed and installed in the BL16XU Industrial Consortium ID Beamline for Material Research at the SPring-8 synchrotron radiation research facility. Equipment specifications are given and results from our initial experiment are discussed in this paper. In the experiment on the sensitivity of detection of metallic impurities an a Si wafer, the lower limit of detection (LLD) using a Ge-SSD reached an order of 10(8) atoms/cm(2) with a corresponding absolute weight of approximately 10 fg for ED-TXRF. In comparison, an order of 10(9) atoms/cm(2) with a corresponding weight of around 100 fg was obtained for WD-TXRF for the first time. Although ED-TXRF still has a lower LLD, using WD-TXRF can provide good energy resolution with a high count rate, opening up a new field of X-ray fluorescence measurement.

引用

页码：L1252 / L1255

页数：4

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