Behavior of NiO thin films sprayed at different annealing time

被引:10
|
作者
El Khalidi, Z. [1 ]
Fadili, S. [1 ]
Hartiti, B. [1 ]
Lfakir, A. [1 ]
Thevenin, P. [1 ]
Siadat, M. [1 ]
机构
[1] Hassan II Univ Casablanca, ANEPMAER Grp FSTM, MAC & PM Lab, Casablanca, Morocco
关键词
NiO thin films; Spray pyrolysis; Refractive index; Extinction coefficient; Urbach energy; ZINC-OXIDE FILMS; PULSED-LASER DEPOSITION; SOL-GEL PREPARATION; DOPED ZNO FILMS; NICKEL-OXIDE; OPTICAL-ABSORPTION; SUBSTRATE-TEMPERATURE; ELECTRICAL-PROPERTIES; PYROSOL PROCESS; TUNGSTEN-OXIDE;
D O I
10.1007/s11082-016-0694-8
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Nickel oxide thin films were prepared by spray pyrolysis, using nickel chloride as precursor at the concentration of 0.05 M, deposited on ordinary glass substrates. The conditions of preparation were fixed except the annealing time, which is described through optical and electrical characterizations. The films exhibit a cubic structure, with a preferential orientation along (111) revealed by X-ray diffraction (XRD). The optical data measured by Lambda 900 UV/VIS/NIR spectrometer showing a transmission below 60 %. The refractive index n (lambda), extinction coefficient (k) and dielectric constants are calculated in the range of (300 and 1000 nm), besides Urbach and the gap energies. The electrical characterization using 4-point probe indicated that the sample with the highest annealing time is less resistive.
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页数:13
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