Electronic and atomic structure of the 6H-SiC(0001) surface studied by ARPES, LEED, and XPS

被引:23
|
作者
Hollering, M [1 ]
Bernhardt, J
Schardt, J
Ziegler, A
Graupner, R
Mattern, B
Stampfl, APJ
Starke, U
Heinz, K
Ley, L
机构
[1] Univ Erlangen Nurnberg, Inst Tech Phys, D-91058 Erlangen, Germany
[2] Univ Erlangen Nurnberg, Lehrstuhl Festkorperphys, D-91058 Erlangen, Germany
[3] La Trobe Univ, Dept Phys, Bundoora, Vic 3083, Australia
关键词
D O I
10.1103/PhysRevB.58.4992
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We present an investigation of the electronic and geometric structure of the carbon terminated 6H-SiC(000 (1) over bar) surface. The samples were prepared in different ways that result in the same unreconstructed (1x1) surface. From angle-resolved photoemission spectra taken along the <(Gamma)over bar> (M) over bar and the <(Gamma)over bar> (K) over bar azimuth, the strong dispersion of a surface state in the ionic gap and of a bulk state at the boundary of the ionic gap is measured. This indicates unambiguously that large areas of the surface are well Ordered. The comparison with band-structure calculations shows that even these areas do not have the properties of an intrinsic 6H-SiC(000 (1) over bar) surface. From a low-energy electron diffraction (LEED) structure analysis of the same surface a model is determined with domains of all three possible bilayer truncations of the bulk unit cell present at the surface with equal weight. For the well-ordered parts of the surface the combination of LEED and core-level x-ray photoemission spectroscopy (XPS) favors a geometry with hydrogen adatoms bonded to the topmost carbon atoms of the first bilayer thus saturating the surface dangling bonds. However, the XPS data also show that the applied sample treatment does not yield a surface that is completely free of oxygen contamination, which must be located in the disordered parts of the surface.
引用
收藏
页码:4992 / 5000
页数:9
相关论文
共 50 条
  • [41] Surface reconstructions of 6H-SiC(0001) and surface-structure-controlled epitaxial growth
    Kitabatake, M
    SILICON CARBIDE, III-NITRIDES AND RELATED MATERIALS, PTS 1 AND 2, 1998, 264-2 : 327 - 330
  • [42] Si doping superlattice structure on 6H-SiC(0001)
    Li, Lianbi
    Zang, Yuan
    Hu, Jichao
    INTERNATIONAL CONFERENCE ON COMPOSITE MATERIAL, POLYMER SCIENCE AND ENGINEERING (CMPSE2017), 2017, 130
  • [43] Structure of few-layer epitaxial graphene on 6H-SiC(0001) at atomic resolution
    Weng, Xiaojun
    Robinson, Joshua A.
    Trumbull, Kathleen
    Cavalero, Randall
    Fanton, Mark A.
    Snyder, David
    APPLIED PHYSICS LETTERS, 2010, 97 (20)
  • [44] Si- and C-rich structure of the 6H-SiC(0001) surface
    J Vac Sci Technol B, 4 (1307):
  • [45] Si-and C-rich structure of the 6H-SiC(0001) surface
    Li, L
    Hasegawa, Y
    Sakurai, T
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1997, 15 (04): : 1307 - 1309
  • [46] Electronic properties of clean unreconstructed 6H-SiC(0001) surfaces studied by angle resolved photoelectron spectroscopy
    Emtsev, K. V.
    Seyller, Th.
    Ley, L.
    Tadich, A.
    Broekman, L.
    Riley, J. D.
    Leckey, R. C. G.
    Preuss, M.
    SURFACE SCIENCE, 2006, 600 (18) : 3845 - 3850
  • [47] Atomistic investigation of various GaN (0001) phases on the 6H-SiC (0001) surface
    Xue, Q
    Xue, QK
    Bakhtizin, RZ
    Hasegawa, Y
    Tsong, IST
    Sakurai, T
    Ohno, T
    PHYSICAL REVIEW B, 1999, 59 (19): : 12604 - 12611
  • [48] Native oxide decomposition and local oxidation of 6H-SiC (0001) surface by atomic force microscopy
    Xie, XN
    Chung, HJ
    Sow, CH
    Wee, ATS
    APPLIED PHYSICS LETTERS, 2004, 84 (24) : 4914 - 4916
  • [49] Stable surface termination on vicinal 6H-SiC(0001) surfaces
    Hayashi, Kenjiro
    Morita, Kouhei
    Mizuno, Seigi
    Tochihara, Hiroshi
    Tanaka, Satoru
    SURFACE SCIENCE, 2009, 603 (03) : 566 - 570
  • [50] Atomic-scale investigation of graphene formation on 6H-SiC(0001)
    Guisinger, N. P.
    Rutter, G. M.
    Crain, J. N.
    Heiliger, C.
    First, P. N.
    Stroscio, J. A.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2008, 26 (04): : 932 - 937