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Characteristics of antiferroelectric PbZrO3 thin films
被引:0
|作者:
Kim, I
[1
]
Bae, S
Kim, K
Kim, H
Lee, JS
Jeong, J
Yamakawa, K
机构:
[1] Univ Ulsan, Dept Phys, Ulsan 680749, South Korea
[2] Kyungsung Univ, Dept Phys, Pusan 608736, South Korea
[3] Pukyong Natl Univ, Dept Phys, Pusan 608737, South Korea
[4] Toshiba Co Ltd, Microelect Engn Lab, Yokohama, Kanagawa, Japan
关键词:
D O I:
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中图分类号:
O4 [物理学];
学科分类号:
0702 ;
摘要:
Antiferroelectric PbZrO3 thin films were synthesized on Pt/Ti/SiO2/Si substrates by using reactive magnetron co-sputtering followed by rapid thermal annealing. At an annealing temperature of 700 degrees C, the PbZrO3 films exhibited a pure perovskite phase with improved crystallinity as evidenced by higher and,sharper (221) and (240) X-ray diffractometer peaks. From the scanning electron microscopy observations, the grains were found to have a columnar structure, and the average grain size was 0.3 - 0.5 mu m. An electric-field-forced transformation from the antiferroelectric phase to the ferroelectric phase was observed at room temperature and had a maximum polarization value of 41 mu C/cm(2). The average fields for exciting the ferroelectric state and that for reversing to the antiferroelectric state, as measured by charge versus voltage curves, were 357 kV/cm and 207 kV/cm, respectively. The dielectric constant was 196 with an associated dissipation factor of 0.043 at 100 kHz. The frequency-dependent response indicated no dispersion below 1 MHz. According to the fatigue measurement, the value of P* of the PbZrO3 film switched up to 10(9) cycles which was a decrease of about 15% compared to the value for a virgin film.
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页码:180 / 184
页数:5
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