Photoluminescence properties of (Al,Ga)N nanostructures grown on Al0.5Ga0.5N (0001)

被引:6
|
作者
Matta, Samuel [1 ,2 ]
Brault, Julien [1 ]
Thi-Huong Ngo [2 ]
Damilano, Benjamin [1 ]
Leroux, Mathieu [1 ]
Massies, Jean [1 ]
Gil, Bernard [2 ]
机构
[1] Univ Cote Azur, CNRS, CRHEA, F-06560 Valbonne, France
[2] Univ Montpellier, L2C, UMR 5221, F-34095 Montpellier 5, France
关键词
Quantum dots; AlGaN; Ultraviolet; Molecular beam epitaxy; MOLECULAR-BEAM EPITAXY; LIGHT-EMITTING-DIODES; QUANTUM DOTS; DEVICES;
D O I
10.1016/j.spmi.2017.12.029
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The optical properties of Al0.1Ga0.9N nanostructures grown by molecular beam epitaxy on Al0.5Ga0.5N (0001) templates are investigated. By combining morphological and photoluminescence (PL) characterizations, we have performed an in-depth analysis of the nanostructures properties as a function of the deposited amount. It is shown that: 1) the nanostructures present an asymmetrical height distribution, and a variation in their shape (i.e. both symmetric and elongated nanostructures are observed); 2) the main PL emission is found in the UV range (above 3.6 eV); and 3) a broad emission in the near UV-blue range is observed. These results allowed to attribute the main PL peak to nanostructures with properties in close agreement to the nominal Al0.1Ga0.9N concentration and deposited amount. Concerning the broad PL band at lower energy, it has been correlated to the formation of an additional type of nanostructures with larger size and lower Al composition compared to the Al0.1Ga0.9N ones. (C) 2017 Elsevier Ltd. All rights reserved.
引用
收藏
页码:161 / 168
页数:8
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