Molecular beam epitaxy growth of nonmagnetic Weyl semimetal LaAlGe thin film

Here, the authors report a detailed method of growing LaAlGe, a nonmagnetic Weyl semimetal, thin film on silicon(100) substrates by molecular beam epitaxy and their structural and electrical characterizations. About 50-nm-thick LaAlGe films were deposited and annealed for 16 h in situ at a temperature of 793 K. As-grown high-quality films showed uniform surface topography and near ideal stoichiometry with a body-centered tetragonal crystal structure. Temperature-dependent longitudinal resistivity can be understood with dominant interband s-d electron-phonon scattering in the temperature range of 5-40 K. Hall measurements confirmed the semimetallic nature of the films with an electron-dominated charge carrier density of similar to 7.15 x 10(21) cm(-3) at 5 K.