Study on radiation chemistry of fluorinated polymers for EUV resist

被引：4

作者：

Nomura, Naoya ^{[1
]}

Okamoto, Kazumasa ^{[1
]}

Yamamoto, Hiroki ^{[2
]}

Kozawa, Takahiro ^{[2
]}

Fujiyoshi, Ryoko ^{[1
]}

Umegaki, Kikuo ^{[1
]}

机构：

[1] Hokkaido Univ, Fac Engn, Div Quantum Sci & Engn, Sapporo, Hokkaido 0608628, Japan

[2] Osaka Univ, ISIR, Osaka 5670047, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 2015年 / 54卷 / 06期

关键词：

CHEMICALLY AMPLIFIED RESISTS; ELECTRON-BEAM RESISTS; DIMER RADICAL-CATION; PULSE-RADIOLYSIS; X-RAY; ACID GENERATORS; ABSORPTION; LITHOGRAPHY; AMPLIFICATION; POLYSTYRENE;

D O I：

10.7567/JJAP.54.06FE03

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The fluorination of a chemically amplified resist is an effective method for use in EUV lithography. However, it has been suggested that the fluorination of the base polymer of the chemically amplified resist induces the electron scavenging reaction by the base polymer and reduces the acid yield. In this study, we clarified the formation of transient species and the acid yields of fluorinated polymers after exposure to the ionizing radiations. The acid yields of fluorinated polymers with hydroxyl groups were lower than that of poly(4-hydroxystyrene) (PHS). The lower acid generation efficiency in fluorinated polymers was due to not only the reaction between fluorinated polymers and electrons but also the lower deprotonation efficiency of the radical cation of the fluorinated polymer. (C) 2015 The Japan Society of Applied Physics

引用

页数：6

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