In-situ FTIR studies of the growth of vanadium dioxide coatings on glass by atmospheric pressure chemical vapour deposition forVCl4 and H2O system

被引：29
|
作者：
Vemardou, D.
Pemble, M. E.
Sheel, D. W.
机构：
[1] Univ Salford, Mat Res Inst, Salford M5 4WT, Lancs, England
[2] Tyndall Natl Inst, Cork, Ireland
来源：
THIN SOLID FILMS | 2007年 / 515卷 / 24期
基金：
英国工程与自然科学研究理事会;
关键词：
FTIR; HCl in-situ monitoring; APCVD; VO2; VCl4;
D O I：
10.1016/j.tsf.2007.03.081
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
This paper describes the use of in-situ FTIR to monitor the growth of VO2 thin films on SiO-precoated glass from VCl4 and H,O under APCVD conditions. It is shown that the amount of H2O introduced during the various reaction conditions can affect the intensity of HCl only in high excess. This observation is attributed to the operation of a possible surface reaction mechanism. The data presented here also suggest that the direct monitoring of the HCl bands might be an excellent process of providing a method of process control. (c) 2007 Published by Elsevier B.V.
引用
收藏
页码：8768 / 8770
页数：3
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