Analysis of a Model of Minority Charge-Carrier Distributions Generated in a Three-Layer Semiconductor Structure by a Wide Electron Beam

被引:3
|
作者
Snopova, M. G. [1 ]
Burylova, I. V. [2 ]
Petrov, V. I. [3 ]
Stepovich, M. A. [2 ]
机构
[1] Moscow State Tech Univ, Kaluga Branch, Kaluga, Russia
[2] Kaluga State Pedag Univ, Kaluga, Russia
[3] Moscow MV Lomonosov State Univ, Moscow, Russia
基金
俄罗斯基础研究基金会;
关键词
Surface Investigation; Neutron Technique; Multilayered Structure; Independent Source; Semiconductor Structure;
D O I
10.1134/S1027451007040088
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Based on the use of a model of independent sources, a method is described for the calculation of minority-charge-carrier distributions generated in three-layer planar semiconductor structures by a wide electron beam with energy typical of electron probe devices (5-30 keV). It is shown that, in limiting cases, equations describing these distributions agree with the data obtained previously for a two-layer semiconductor structure.
引用
收藏
页码:406 / 410
页数:5
相关论文
共 26 条