Electron emission from patterned diamond flat cathodes

被引：0
|
作者：
Tolt, ZL
Fink, RL
Yaniv, Z
机构：
来源：
IVMC'97 - 1997 10TH INTERNATIONAL VACUUM MICROELECTRONICS CONFERENCE, TECHNICAL DIGEST | 1997年
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D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
A novel substrate pre-deposition treatment process is used to pattern and enhance the emission properties of diamond flat cathode films. An advantage of this process is that diamond grit abrasive process steps are not required for the enhanced emission properties. The pre-deposition treatment also eliminates the possibility of degrading cathode performance resulting from post-growth processes.
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页码：171 / 175
页数：5
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