gm/Id Method for Threshold Voltage Extraction Applicable in Advanced MOSFETs With Nonlinear Behavior Above Threshold

被引:66
|
作者
Flandre, Denis [1 ]
Kilchytska, Valeria [1 ]
Rudenko, Tamara [2 ]
机构
[1] Catholic Univ Louvain, ICTEAM Inst, B-1348 Louvain, Belgium
[2] Natl Acad Sci Ukraine, Inst Semicond Phys, UA-03028 Kiev, Ukraine
关键词
FinFET; modeling; MOSFETs; silicon-on-insulator technology; threshold voltage; ultrathin dielectrics; ultrathin silicon; PARAMETER EXTRACTION;
D O I
10.1109/LED.2010.2055829
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A method is proposed for determining the threshold voltage in a MOSFET, based on the derivative of the g(m)/I-d ratio with respect to the gate voltage, which theoretically originates from the unified charge-control model similar to the capacitance-derivative method. This yields threshold voltages significantly less affected by gate-voltage-dependent mobility and series resistance than linear-extrapolation techniques. Moreover, it is more physically adequate in the case of advanced MOSFETs with ultrathin dielectrics, thin SOI body, or double gate operation, featuring a gradual transition from the exponential to linear charge control. The robustness of the method is experimentally verified on FinFETs with different lengths.
引用
收藏
页码:930 / 932
页数:3
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