Design, fabrication, and characterization of electrical and fluidic interconnections for a multi-chip microelectroflumic bench

被引:0
|
作者
Do Suk, S [1 ]
Chang, S [1 ]
Cho, YH [1 ]
机构
[1] Stanford Univ, Dept Mech Engn, Stanford, CA 94305 USA
关键词
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We present the design, fabrication, and characterization of a multi-chip microelectrofluidic bench, achieving both electrical and fluidic interconnections with a simple, low-loss and low-temperature electrofluidc interconnection method. We design 4-chip microelectrofluidic bench, having three electrical pads and two fluidic I/O ports. Each device chip, having three electrical interconnections and a pair of two fluidic I/O interconnections, can be assembled to the microelectofluidic bench with electrical and fluidic interconnections. In the electrical and fluidic characterization, we measure the electrical resistance of 0.26 Omega/mm in the line and 0.64 +/- 0.58 Omega in the interconnection. Also, we measure the average pressure drop of 13.6 similar to 125.4 Pa/mm with the nonlinearity of 3.1% for the flow-rates of 10 similar to 100 mu l/min in the line and 17Pa with the uncertainty of 65Pa in the interconnection.
引用
收藏
页码:658 / 661
页数:4
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