Large photosensitivity in lead-silicate glasses

被引：27
|
作者：
Long, XC [1 ]
Brueck, SRJ
机构：
[1] Univ New Mexico, Ctr High Technol Mat, Albuquerque, NM 87106 USA
[2] Univ New Mexico, Dept Phys & Astron, Albuquerque, NM 87106 USA
[3] Univ New Mexico, Dept Elect & Comp Engn, Albuquerque, NM 87106 USA
来源：
APPLIED PHYSICS LETTERS | 1999年 / 74卷 / 15期
关键词：
D O I：
10.1063/1.123772
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Strong, permanent surface-relief and refractive index gratings are written in lead-silicate glasses by irradiation with the output of a pulsed KrF excimer laser (248 nm) through a phase mask. Diffraction efficiencies as high as 10% are obtained. The diffraction efficiency of the refractive index grating after removal of the surface-relief grating shows that a very large photoinduced refractive index change (Delta n(0) = 0.09+/-0.02) is obtained. (C) 1999 American Institute of Physics. [S0003-6951(99)03815-2].
引用
收藏
页码：2110 / 2112
页数：3
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