A model of CMP - III. Inhibitors

被引：20
|
作者：
Paul, E [1 ]
Vacassy, R
机构：
[1] Stockton Coll, Pomona, NJ 08240 USA
[2] Cabot Microelect, Aurora, IL 60504 USA
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 2003年 / 150卷 / 12期
关键词：
D O I：
10.1149/1.1621419
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
A model of chemical mechanical polishing (CMP), based on a steady-state balance between chemical growth kinetics for a surface film and its mechanical removal rates, is extended to include the effects of inhibitors on the polishing rate. The general case provides qualitative insights into the process and presents a quantitative measure of inhibitor effectiveness. The model is applied to the case of tungsten CMP, with modifications in some details based on the complexity of the tungsten oxide surface film. The model is used to interpret data for three inhibitors in four slurry formulations and to explain their qualitatively different behaviors. (C) 2003 The Electrochemical Society.
引用
收藏
页码：G739 / G743
页数：5
相关论文
共 50 条
  • [1] Patuxent Landscape Model. III. Model calibration
    A. Voinov
    R. Costanza
    T. Maxwell
    H. Vladich
    [J]. Water Resources, 2007, 34 : 372 - 384
  • [2] Patuxent Landscape Model. III. Model calibration
    Voinov, A.
    Costanza, R.
    Maxwell, T.
    Vladich, H.
    [J]. WATER RESOURCES, 2007, 34 (04) : 372 - 384
  • [3] CMP AND CMP-SUGAR ANALOGS AS SIALYLTRANSFERASE INHIBITORS
    KORYTNYK, W
    ANGELINO, N
    BERNACKI, R
    KLOHS, W
    [J]. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1978, 176 (SEP): : 29 - 29
  • [4] III.
    Simonds, Sandra
    [J]. AMERICAN POETRY REVIEW, 2021, 50 (01): : 8 - 8
  • [5] III.
    Agrawal, O.P.
    Khatkar, S.P.
    [J]. Journal of the Electrochemical Society of India, 1984, 33 (04): : 275 - 277
  • [6] Bioterrorism III. Model spread of anthrax substituent
    Kubatova, Hana
    Klouda, Karel
    Placakova, Hana
    Dropa, Tomas
    Urban, Martin
    Bilek, Karel
    Kalikova, Jitka
    Lichorobiec, Stanislav
    [J]. POZARNI OCHRANA 2010, 2010, : 158 - 161
  • [7] A model for the explanation of light emission. III.
    Gehrcke, E
    [J]. PHYSIKALISCHE ZEITSCHRIFT, 1914, 15 : 344 - 348
  • [8] Blocking inhibitors in cathodic leveling III. Electrochemical impedance spectroscopy study
    Madore, C
    Agarwal, P
    Landolt, D
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1998, 145 (05) : 1561 - 1565
  • [9] Application of a CMP model to tungsten CMP
    Paul, E
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2001, 148 (06) : G359 - G363
  • [10] NiCoFe ternary alloy deposition - III. A mathematical model
    Zhuang, Y
    Podlaha, EJ
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2003, 150 (04) : C225 - C233
12345