Laser-induced damage thresholds and mechanism of silica glass induced by ultra-short soft x-ray laser pulse irradiation

被引：11

作者：

Mikami, Katsuhiro ^{[1
]}

Ishino, Masahiko ^{[2
]}

Dinh, Thanh-Hung ^{[2
]}

Motokoshi, Shinji ^{[3
]}

Hasegawa, Noboru ^{[2
]}

Kon, Akira ^{[4
,5
]}

Inubushi, Yuichi ^{[4
,5
]}

Owada, Shigeki ^{[4
,5
]}

Kinoshita, Hiroo ^{[6
]}

Nishikino, Masaharu ^{[2
]}

机构：

[1] Kindai Univ, Fac Biol Oriented Sci & Technol, 930 Nishi Mitani, Wakayama 6496493, Japan

[2] Natl Inst Quantum & Radiol Sci & Technol, Kansai Photon Sci Inst, 8-1-7 Umemi Dai, Kizugawa, Kyoto 6190215, Japan

[3] Inst Laser Technol, Nishi Ku, 1-8-4 Utsubo Honmachi, Osaka 5500004, Japan

[4] Japan Synchrotron Radiat Res Inst JASRI, 1-1-1 Kouto, Sayo, Hyogo 6795198, Japan

[5] RIKEN SPring 8 Ctr, 1-1-1 Kouto, Sayo, Hyogo 6795148, Japan

[6] Univ Hyogo, 3-1-2 Kouto, Kamigori, Hyogo 6781205, Japan

来源：

OPTICS LETTERS | 2020年 / 45卷 / 08期

基金：

日本学术振兴会;

关键词：

TEMPERATURE-DEPENDENCE; DIELECTRICS; ABLATION; NANOSECOND; SIZE; NM;

D O I：

10.1364/OL.389288

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Laser-induced damage thresholds (LIDTs) of silica glasses obtained by the femtosecond soft x-ray free-electron laser (SXFEL, 13.5 nm, 70 fs) and the picosecond soft x-ray laser (SXRL, 13.9 nm, 7 ps) are evaluated. The volume of the hydroxyl group in the silica glasses influenced its LIDTs. The LIDTs obtained in this research by the femtosecond. SXFEL and the picosecond SXRL were nearly identical, but were different from that by the nanosecond soft x-ray pulse. The photoionization processes of silica glass in context of the laser-induced damage mechanism (LIDM) are also discussed. In the ultra-short soft x-ray pulse irradiation regime, the LIDM can be speculated to include the spallation process with a scission of bondings. (C) 2020 Optical Society of America

引用

页码：2435 / 2438

页数：4

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