Influence of the plasma/wall interactions on the operation of Hall thrusters
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作者:
Makowski, K
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机构:
Inst Fundamental Technol Res, PL-00049 Warsaw, PolandInst Fundamental Technol Res, PL-00049 Warsaw, Poland
Makowski, K
[1
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Barral, S
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机构:
Inst Fundamental Technol Res, PL-00049 Warsaw, PolandInst Fundamental Technol Res, PL-00049 Warsaw, Poland
Barral, S
[1
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Peradzynski, Z
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机构:
Inst Fundamental Technol Res, PL-00049 Warsaw, PolandInst Fundamental Technol Res, PL-00049 Warsaw, Poland
Peradzynski, Z
[1
]
Dudeck, M
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机构:
Inst Fundamental Technol Res, PL-00049 Warsaw, PolandInst Fundamental Technol Res, PL-00049 Warsaw, Poland
Dudeck, M
[1
]
机构:
[1] Inst Fundamental Technol Res, PL-00049 Warsaw, Poland
来源:
THIRD INTERNATIONAL CONFERENCE ON SPACECRAFT PROPULSION
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2000年
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465卷
关键词:
D O I:
暂无
中图分类号:
V [航空、航天];
学科分类号:
08 ;
0825 ;
摘要:
Stationnary Plasma Thrusters are electric thrusters which are especially well suited for geostationary stationkeeping of satellites and low-orbit transfers. We present here a study of the influence of the channel material on the performances, based on the results of a I-D fluid model. Stationary and transient analysis were performed, showing that materials with low electron secondary emission increase the efficiency via a better propellant ionization, although they lead to wider current oscillations.bellevue.
机构:
Science and Technology on Vacuum Technology and Physics Laboratory Lanzhou Institute of PhysicsSchool of Energy Science and Engineering Harbin Institute of Technology
王尚民
郭宁
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h-index: 0
机构:
Science and Technology on Vacuum Technology and Physics Laboratory Lanzhou Institute of PhysicsSchool of Energy Science and Engineering Harbin Institute of Technology
机构:
Science and Technology on Vacuum Technology and Physics Laboratory Lanzhou Institute ofSchool of Energy Science and Engineering Harbin Institute of Technology
王尚民
郭宁
论文数: 0引用数: 0
h-index: 0
机构:
Science and Technology on Vacuum Technology and Physics Laboratory Lanzhou Institute ofSchool of Energy Science and Engineering Harbin Institute of Technology