Room-temperature InAlAs/InGaAs/InP planar resonant tunneling-coupled transistor

被引:11
|
作者
Moon, JS [1 ]
Rajavel, R [1 ]
Bui, S [1 ]
Wong, D [1 ]
Chow, DH [1 ]
机构
[1] HRL Labs LLC, Malibu, CA 90265 USA
关键词
D O I
10.1063/1.2126108
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report an experimental demonstration of room-temperature InAlAs/InGaAs/InP planar two-dimensional to two-dimensional resonant tunneling-coupled transistors, in which the tunneling characteristics such as negative differential resistance and peak current are controlled by a surface Schottky gate similar to the state-of-the-art high-electron-mobility transistors (HEMT) with high gain. The tunneling peak voltage was modulated linearly with the Schottky gate voltage with a ratio of nearly unity. Functionality of the device can also be switched between HEMT and tunneling transistor mode. The fabrication process is fully compatible with conventional HEMT processes, offering a fully integrable and scalable tunneling transistor technology. (C) 2005 American Institute of Physics.
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收藏
页码:1 / 3
页数:3
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