Precision thickness measurement of ultra-thin films via XPS

被引:8
|
作者
Geng, SJ
Zhang, S
Onishi, H
机构
[1] Nanyang Technol Univ, Sch Mech & Prod Engn, Singapore 639798, Singapore
[2] Shimadza Asia Pacific Pte Ltd, Singapore 118227, Singapore
来源
关键词
applications; ESCA; thickness measurement; ultra-thin films; XPS;
D O I
10.4028/www.scientific.net/MSF.437-438.195
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
XPS (X-ray Photoelectron Spectroscopy) or ESCA (Electron Spectroscopy for Chemical Analysis) can accurately measure the thickness of ultra-thin films thinner than 2 rim and its precision is +/- 0.1nm. XPS remedy the defection of TEM that is difficult to determine the thickness for films thinner than 1 rim, but XPS is not accurate for films thicker than 10 rim. This paper aims at reviewing the application of XPS in determining thickness of ultra-thin films.
引用
收藏
页码:195 / 198
页数:4
相关论文
共 50 条
  • [41] Phase transformation in ultra-thin films
    Chakraborty, J.
    RESIDUAL STRESSES IX, 2014, 996 : 860 - 865
  • [42] RESISTIVITY OF ROUGH ULTRA-THIN FILMS
    KIERUL, J
    LEDZION, J
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1992, 129 (02): : K93 - K95
  • [43] A review of ultra-thin ferroelectric films
    Yuan, Zi-Lin
    Sun, Yu
    Wang, Dan
    Chen, Ke-Qiu
    Tang, Li-Ming
    JOURNAL OF PHYSICS-CONDENSED MATTER, 2021, 33 (40)
  • [44] Traceable thickness measurement of ultra-thin HfO2 films by medium-energy ion scattering spectroscopy
    Kim, Kyung Joong
    Kim, Tae Gun
    Kwon, Ji-Hwan
    Ruh, Hyun
    Park, Kyungsu
    Min, Won Ja
    METROLOGIA, 2020, 57 (02)
  • [45] Stress-strain measurement of ultra-thin polystyrene films: Film thickness and molecular weight dependence of crazing stress
    Hasegawa, Hiroki
    Ohta, Takashi
    Ito, Kohzo
    Yokoyama, Hideaki
    POLYMER, 2017, 123 : 179 - 183
  • [46] PRECISION-MEASUREMENT OF THICKNESS OF THIN-FILMS BY KIESSIGS METHOD
    MALYUKOV, BA
    KOROLEV, VE
    MEASUREMENT TECHNIQUES, 1973, 16 (06) : 833 - 835
  • [47] Thickness determination of ultra-thin SiO2 films on Si by spectroscopic ellipsometry
    Nguyen, NV
    Richter, CA
    PROCEEDINGS OF THE SYMPOSIUM ON SILICON NITRIDE AND SILICON DIOXIDE THIN INSULATING FILMS, 1997, 97 (10): : 183 - 193
  • [48] A comparative investigation of thickness measurements of ultra-thin water films by scanning probe techniques
    Opitz, A.
    Scherge, M.
    Ahmed, S. I. -U.
    Schaefer, J. A.
    JOURNAL OF APPLIED PHYSICS, 2007, 101 (06)
  • [49] Film-thickness dependence of structure formation in ultra-thin polymer blend films
    J.S. Gutmann
    P. Müller-Buschbaum
    M. Stamm
    Applied Physics A, 2002, 74 : s463 - s465
  • [50] In situ thickness measurements of ultra-thin multilayer polymer films by atomic force microscopy
    USP, Inst. de Fis. de São Carlos, CP 369, 13560-970 São Carlos, SP, Brazil
    不详
    Nanotechnology, 4 (389-393):