Plasma-Assisted Synthesis of Carbon Nanotubes

被引：34

作者：

Lim, San Hua ^{[1
]}

Luo, Zhiqiang ^{[1
,2
]}

Shen, ZeXiang ^{[2
]}

Lin, Jianyi ^{[1
]}

机构：

[1] ASTAR, Inst Chem & Engn Sci, Singapore 627833, Singapore

[2] Nanyang Technol Univ, Sch Phys & Math Sci, Div Phys & Appl Phys, Singapore 637616, Singapore

来源：

NANOSCALE RESEARCH LETTERS | 2010年 / 5卷 / 09期

关键词：

Plasma; Carbon; Nanotubes; Ion bombardment; CHEMICAL-VAPOR-DEPOSITION; LOW-TEMPERATURE GROWTH; ROOM-TEMPERATURE; FIELD-EMISSION; NANOFIBERS; INTEGRATION; DIFFUSION; MECHANISM; REACTOR; FILMS;

D O I：

10.1007/s11671-010-9710-2

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The application of plasma-enhanced chemical vapour deposition (PECVD) in the production and modification of carbon nanotubes (CNTs) will be reviewed. The challenges of PECVD methods to grow CNTs include low temperature synthesis, ion bombardment effects and directional growth of CNT within the plasma sheath. New strategies have been developed for low temperature synthesis of single-walled CNTs based the understanding of plasma chemistry and modelling. The modification of CNT surface properties and synthesis of CNT hybrid materials are possible with the utilization of plasma.

引用

页码：1377 / 1386

页数：10

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