Effects of argon plasma treating on surface morphology and gas ionization property of carbon nanotubes

被引：17
|
作者：
Yan, BY [1 ]
Qian, KY [1 ]
Zhang, YF [1 ]
Xu, D [1 ]
机构：
[1] Shanghai Jiao Tong Univ, Res Inst Micro Nanometer Sci & Technol, Key Lab Thin Film & Microfabricat, Minist Educ, Shanghai 200030, Peoples R China
来源：
PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES | 2005年 / 28卷 / 01期
关键词：
carbon nanotube; surface treatment; gas ionization; argon plasma process;
D O I：
10.1016/j.physe.2005.02.004
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
The effect of surface treatment by argon plasma on the surface morphology and gas ionization property of carbon nanotube film were studied. The surface of as-grown CNT films prepared by chemical vapor deposition was treated by argon plasma in reactive ion etcher (RIE). In order to compare the microstructure of untreated CNT film with treated CNT film, scanning electron microscopy was employed. The ionization properties of distinct gas based on the untreated and treated CNT film were measured and compared. The reasons for the observed effects were discussed. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码：88 / 92
页数：5
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