Dynamic Breakdown Voltage of GaN Power HEMTs

被引:51
|
作者
Zhang, R. [1 ]
Kozak, J. P. [1 ]
Song, Q. [1 ]
Xiao, M. [1 ]
Liu, J. [1 ]
Zhang, Y. [1 ]
机构
[1] Virginia Polytech Inst & State Univ, Ctr Power Elect Syst, Blacksburg, VA 24061 USA
关键词
D O I
10.1109/IEDM13553.2020.9371904
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This work develops a new method to measure the transient breakdown voltage (BV) of a non-avalanche device in ultra-short pulses, based on the unclamped inductive switching (UIS) setup. For the first time, the transient BVs of two types of 600/650-V enhancement-mode p-gate GaN high-electron-mobility transistors (HEMTs) are measured across the pulse duration from 25 ns (dv/dt > 100 V/ns) to 2 s. The BV is found to increase with the decreased pulse width, up to 500 V higher than the static BV. This behavior is explained by the reduced buffer trapping and the resulted lower peak electric field in shorter pulses. Slightly different BV dependences on pulse width are observed in the two types of devices and the mechanisms are unveiled. Repetitive UIS tests are also conducted, revealing that this newly-found "dynamic BV" can provide GaN HEMTs additional overvoltage and surge energy margin in power applications. These findings provide critical new insights on the BV and ruggedness of GaN HEMTs.
引用
收藏
页数:4
相关论文
共 50 条
  • [21] Design and simulation of high breakdown voltage AlGaN/GaN HEMTs with a charged passivation layer for microwave power applications
    Du, Jiangfeng
    Jiang, Zhiguang
    Bai, Zhiyuan
    Pan, Peilin
    Yu, Qi
    JOURNAL OF COMPUTATIONAL ELECTRONICS, 2017, 16 (03) : 741 - 747
  • [22] Dynamic On-Resistance and Threshold Voltage Instability Evaluation Circuit for Power GaN HEMTs Devices
    Kumar, Rustam
    Wu, Tian-Li
    IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS, 2024, 71 (09) : 11706 - 11709
  • [23] Design and simulation of high breakdown voltage AlGaN/GaN HEMTs with a charged passivation layer for microwave power applications
    Jiangfeng Du
    Zhiguang Jiang
    Zhiyuan Bai
    Peilin Pan
    Qi Yu
    Journal of Computational Electronics, 2017, 16 : 741 - 747
  • [24] High Breakdown Voltage P-GaN Gate HEMTs With Threshold Voltage of 7.1 V
    Chen, Siheng
    Cui, Peng
    Luo, Xin
    Wang, Liu
    Dai, Jiacheng
    Qi, Kaifa
    Zhang, Tieying
    Linewih, Handoko
    Lin, Zhaojun
    Xu, Xiangang
    Han, Jisheng
    IEEE ELECTRON DEVICE LETTERS, 2024, 45 (12) : 2343 - 2346
  • [25] High breakdown voltage AlGaN/GaN HEMTs employing fluoride plasma treatment
    Cho, Kyu-Heon
    Choi, Young-Hwan
    Lim, Jiyong
    Han, Min-Koo
    PHYSICA SCRIPTA, 2008, 78 (06)
  • [26] High Breakdown Voltage in RF AlN/GaN/AlN Quantum Well HEMTs
    Hickman, Austin
    Chaudhuri, Reet
    Bader, Samuel James
    Nomoto, Kazuki
    Lee, Kevin
    Xing, Huili Grace
    Jena, Debdeep
    IEEE ELECTRON DEVICE LETTERS, 2019, 40 (08) : 1293 - 1296
  • [27] High Breakdown Voltage and Low Thermal Effect Micromachined AlGaN/GaN HEMTs
    Chiu, Hsien-Chin
    Wang, Hsiang-Chun
    Yang, Chih-Wei
    Hsin, Yue-Ming
    Chyi, Jen-Inn
    Wu, Chang-Luen
    Chang, Chian-Sern
    IEEE TRANSACTIONS ON DEVICE AND MATERIALS RELIABILITY, 2014, 14 (02) : 726 - 731
  • [28] Degradation and Recovery of GaN HEMTs in Overvoltage Hard Switching Near Breakdown Voltage
    Kozak, Joseph P.
    Song, Qihao
    Zhang, Ruizhe
    Ma, Yunwei
    Liu, Jingcun
    Li, Qiang
    Saito, Wataru
    Zhang, Yuhao
    IEEE TRANSACTIONS ON POWER ELECTRONICS, 2023, 38 (01) : 435 - 446
  • [29] Impact of Drain Electrode Shape Irregularities on Breakdown Voltage of AlGaN/GaN HEMTs
    Ohi, Shintaro
    Makino, Shinya
    Yamazaki, Taisei
    Tokuda, Hirokuni
    Asubar, Joel Tacla
    Kuzuhara, Masaaki
    2016 COMPOUND SEMICONDUCTOR WEEK (CSW) INCLUDES 28TH INTERNATIONAL CONFERENCE ON INDIUM PHOSPHIDE & RELATED MATERIALS (IPRM) & 43RD INTERNATIONAL SYMPOSIUM ON COMPOUND SEMICONDUCTORS (ISCS), 2016,
  • [30] Characterization of short channel AlGaN/GaN HEMTs breakdown voltage and gate recess
    Breitschädel, O
    Kley, L
    Gräbeldinger, H
    Kuhn, B
    Scholz, F
    Schweizer, H
    PROCEEDINGS OF THE INTERNATIONAL WORKSHOP ON NITRIDE SEMICONDUCTORS, 2000, 1 : 961 - 964