Advanced complementary color filter technology without dyeing process for CCD image sensors

Advanced complementary color filter technology without dyeing process has been developed to simplify color filter fabrication process and to improve UV-resistance and thermal stability of color filter for CCD image sensors and CMOS image sensors. Using this advanced technology, complementary color filter is able to be fabricated by conventional lithography process with usual TMAH developer. This technology has achieved fine resolution of less than 1.5 mu m lines and spaces in spite of previous inclusion of complementary colorings within the photo-sensitive polymers. These photo-sensitive polymers are negative type and consist of five key elements. The performance of the color filter characteristics that UV-resistance is more than 30 million lux hour and thermal stability is more than 250 degrees C, has been realized by the advanced technology. Consequently this technology has been applied to 1/4-inch CCD image sensors, the optical color characteristics of the CCD image sensors has been achieved nearly same and good color spectrums as the conventional one.