Optical characterization of rf inductively coupled plasmas

被引：0
|
作者：
Wendt, AE [1 ]
Beale, DF [1 ]
Hitchon, WNG [1 ]
Keiter, E [1 ]
Kolobov, V [1 ]
Mahoney, L [1 ]
Pierre, AA [1 ]
Stittsworth, J [1 ]
机构：
[1] Univ Wisconsin, Dept Elect & Comp Engn, Madison, WI 53706 USA
来源：
ELECTRON KINETICS AND APPLICATIONS OF GLOW DISCHARGES | 1998年 / 367卷
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中图分类号：
O59 [应用物理学];
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页码：489 / 502
页数：14
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