user

Preparation of transparent conducting Al-doped ZnO thin films by single source chemical vapor deposition

被引：0
|
作者：
Zhang, W. Y. [1 ,2 ]
He, D. K. [2 ]
Liu, Z. Z. [1 ]
Sun, L. J. [2 ]
Fu, Z. X. [2 ]
机构：
[1] Luoyang Normal Coll, Coll Phys & Elect Informat, Luoyang 471022, Peoples R China
[2] Univ Sci & Technol China, Dept Phys, Hefei 230026, Peoples R China
来源：
OPTOELECTRONICS AND ADVANCED MATERIALS-RAPID COMMUNICATIONS | 2010年 / 4卷 / 11期
关键词：
Chemical vapor deposition; AZO; Thin film; OPTICAL-PROPERTIES;
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Transparent conducting Al-doped zinc oxide (AZO) thin films have been fabricated on quartz substrates by single source CVD system. Effects of annealing temperature and Al-doping concentration on the optical and electrical properties of AZO films were investigated. AZO film with Al/Zn ratio of 1 % annealed at 700 degrees C has high optical transmittance of 88.2 % and low electrical resistivity of 1.85x10(-2) Omega cm. Hall measurements and absorption edge analysis demonstrate that resistivity of AZO films is determined by carrier concentration rather than carrier mobility.
引用
收藏
页码：1651 / 1654
页数：4
相关论文
共 50 条
  • [1] A wet chemical preparation of transparent conducting thin films of Al-doped ZnO nanoparticles
    Konstantin Tarasov
    Olivier Raccurt
    [J]. Journal of Nanoparticle Research, 2011, 13 : 6717 - 6724
  • [2] A wet chemical preparation of transparent conducting thin films of Al-doped ZnO nanoparticles
    Tarasov, Konstantin
    Raccurt, Olivier
    [J]. JOURNAL OF NANOPARTICLE RESEARCH, 2011, 13 (12) : 6717 - 6724
  • [3] Transparent conducting Al-doped ZnO thin films prepared by pulsed laser deposition
    Suzuki, A
    Matsushita, T
    Wada, N
    Sakamoto, Y
    Okuda, M
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1996, 35 (1A): : L56 - L59
  • [4] Deposition of Transparent Conducting Al-doped ZnO Thin Films by ICP-Assisted Sputtering
    Shindo, Ryota
    Iwata, Tadashi
    Hirashima, Akinori
    Shinohara, Masanori
    Matsuda, Yoshinobu
    [J]. TENCON 2010: 2010 IEEE REGION 10 CONFERENCE, 2010, : 1002 - 1006
  • [5] Filtered vacuum arc deposition of transparent conducting Al-doped ZnO films
    Zhitomirsky, V. N.
    Cetinorgu, E.
    Adler, E.
    Rosenberg, Yu.
    Boxman, R. L.
    Goldsmith, S.
    [J]. THIN SOLID FILMS, 2006, 515 (03) : 885 - 890
  • [6] Pulsed electron beam deposition of transparent conducting Al-doped ZnO films
    Pham Hong Quang
    Ngo Dinh Sang
    Do Quang Ngoc
    [J]. THIN SOLID FILMS, 2012, 520 (21) : 6455 - 6458
  • [7] Characterization of transparent conducting Al-doped ZnO thin films and device applications
    Lee, Sang Hern
    Yu, Young Moon
    Kim, Tae Hoon
    Jeong, Se-Young
    [J]. JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2007, 51 : S79 - S83
  • [8] Transparent and conducting boron doped ZnO thin films grown by aerosol assisted chemical vapor deposition
    Zhao, Donglei
    Sathasivam, Sanjayan
    Wang, Mingyue
    Carmalt, Claire J. J.
    [J]. RSC ADVANCES, 2022, 12 (51) : 33049 - 33055
  • [9] Photoluminescence and electrical properties of epitaxial Al-doped ZnO transparent conducting thin films
    Noh, Jun Hong
    Cho, In-Sun
    Lee, Sangwook
    Cho, Chin Moo
    Han, Hyun Soo
    An, Jae-Sul
    Kwak, Chae Hyun
    Kim, Jin Yong
    Jung, Hyun Suk
    Lee, Jung-Kun
    Hong, Kug Sun
    [J]. PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2009, 206 (09): : 2133 - 2138
  • [10] Comparative studies of Al-doped ZnO and Ga-doped ZnO transparent conducting oxide thin films
    Jun, Min-Chul
    Park, Sang-Uk
    Koh, Jung-Hyuk
    [J]. NANOSCALE RESEARCH LETTERS, 2012, 7
12345