Energy-filtered electron backscatter diffraction (vol 108, pg 116, 2008)

被引：0
|
作者：
Deal, Andrew [1 ]
Hooghan, Tejpal [2 ]
Eades, Alwyn [3 ]
机构：
[1] GE Global Res, Niskayuna, NY 12309 USA
[2] Texas Instrument Inc, Dallas, TX 75243 USA
[3] Lehigh Univ, Dept Mat Sci & Engn, Bethlehem, PA 18015 USA
来源：
ULTRAMICROSCOPY | 2008年 / 108卷 / 07期
关键词：
D O I：
10.1016/j.ultramic.2008.02.001
中图分类号：
TH742 [显微镜];
学科分类号：
摘要：
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页码：706 / 706
页数：1
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