Formation mechanisms for carbon onions and nanocapsules in C+-ion implanted copper

被引:11
|
作者
Abe, H [1 ]
Yamamoto, S
Miyashita, A
Sickafus, KE
机构
[1] Japan Atom Energy Res Inst, Dept Mat Dev, Gunma 3701292, Japan
[2] Los Alamos Natl Lab, Div Mat Sci & Technol, Los Alamos, NM 87545 USA
关键词
D O I
10.1063/1.1402143
中图分类号
O59 [应用物理学];
学科分类号
摘要
Copper substrates were implanted with carbon ions at temperature ranging from 570 to 973 K. Implantation microstructures were investigated using transmission electron microscopy and high-resolution electron microscopy. Carbon onions and nanocapsules were observed together with amorphous carbon layers. Most of the nanocapsules were found to be hollow and rarely included copper nanoparticles. The encapsulating of Cu nanoparticles with graphene layers, the gradual shrinkage of the encapsulated clusters, and finally the disappearance of the clusters (leaving behind hollow nanocapsules) were observed under electron irradiation at 783 K. Statistics of cluster size as a function of ion fluence, implantation temperature, and substrate crystallinity gave insights into the nucleation processes of onions and nanocapsules. One process involves the formation of graphene layers on grain boundaries to encapsulate copper particles. The other process is the nucleation of graphene cages, probably fullerenes, due to high concentration of carbon atoms and high amount of radiation damage. (C) 2001 American Institute of Physics.
引用
收藏
页码:3353 / 3358
页数:6
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