Explosive, critical electron emission from dielectric induced by high-current-density electron beam injection; theoretical and computer simulation

被引:0
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作者
Vaisburd, DI [1 ]
Tukhfatulin, TA [1 ]
机构
[1] Russian Acad Sci, Inst High Current Elect, Tomsk 634055, Russia
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中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
High-current-density (HCD) electron beams of nanosecond pulse duration are applied for charge injection into various dielectrics to induce the critical electron emission from dielectric into vacuum. It is shown that critical electron emission induced by HCD injection of electrons arises in the form of gigantic single pulse, which is of peak value of 10-1000 A and delayed from injection one for 1-20 ns. Delay time depends on the current density of primary electron beam. The direct experimental evidence is obtained for intense generation of free electrons and holes in subsurface layer of a dielectric owing to Poole-Frenkel effect and impact ionisation of traps in high electric field. And this process is considered to be the main reason for the sharp transition of the ordinary low-current-density field electron emission to the high-power one. The last is not uniform and accompanied by point explosions on the dielectric surface and ejections of ion plasmas from these points into vacuum. And these explosions are considered as the main reason for the transition of the field electron emission from dielectric (FEED) to the critical one. So the last is explosion electron emission of dielectrics (EEED). If the electron current to the emitting centers on the dielectric surface is maintained at the necessary value then the critical electron emission always causes the vacuum discharge between the dielectric surface and metallic collector. The mechanism of EEED is discussed using the computer simulation of the basic processes.
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页码:166 / 169
页数:4
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