Silicon wafer bonding for encapsulating surface-micromechanical-systems using intermediate glass layers

被引:0
|
作者
Knechtel, R [1 ]
Heller, J [1 ]
Wiemer, M [1 ]
Frömel, J [1 ]
机构
[1] X FAB Semicond Foundries AG, D-99097 Erfurt, Germany
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中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper gives an overview about possibilities for wafer level encapsulation of surface micromachined structures. The particular characteristics of these structures lead to particular requirements regarding wafer bonding technologies. With respect to these requirements and reliability issues, wafer bonding based on intermediate glass layers is found to be suitable for this special application. Especially glass frit bonding offers a lot of advantages when used for the encapsulation of surface micromachined structures. In the present paper this technique is reviewed in detail and an example is given where the technique has been used for the encapsulation of an acceleration sensor.
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页码:321 / 328
页数:8
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