Surface oxidation energetics and kinetics on MoS2 monolayer

被引:207
|
作者
Santosh, K. C. [1 ]
Longo, Roberto C. [1 ]
Wallace, Robert M. [1 ,2 ]
Cho, Kyeongjae [1 ,2 ]
机构
[1] Univ Texas Dallas, Dept Mat Sci & Engn, Richardson, TX 75080 USA
[2] Univ Texas Dallas, Dept Phys, Richardson, TX 75080 USA
关键词
INITIO MOLECULAR-DYNAMICS; FINDING SADDLE-POINTS; AB-INITIO; TRANSITION; ADSORPTION; SILICON; WAVE; PHOTOLUMINESCENCE; CHEMISTRY; BEHAVIOR;
D O I
10.1063/1.4916536
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this work, surface oxidation of monolayer MoS2 (one of the representative semiconductors in transition-metal dichalcogenides) has been investigated using density functional theory method. Oxygen interaction with MoS2 shows that, thermodynamically, the surface tends to be oxidized. However, the dissociative absorption of molecular oxygen on the MoS2 surface is kinetically limited due to the large energy barrier at low temperature. This finding elucidates the air stability of MoS2 surface in the atmosphere. Furthermore, the presence of defects significantly alters the surface stability and adsorption mechanisms. The electronic properties of the oxidized surface have been examined as a function of oxygen adsorption and coverage as well as substitutional impurities. Our results on energetics and kinetics of oxygen interaction with the MoS2 monolayer are useful for the understanding of surface oxidation, air stability, and electronic properties of transition-metal dichalcogenides at the atomic scale. (C) 2015 AIP Publishing LLC.
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页数:8
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