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Electrochemical doping for lowering contact barriers in organic field effect transistors
被引:16
|作者:
Schaur, Stefan
[1
]
Stadler, Philipp
[1
]
Meana-Esteban, Beatriz
[1
,2
,3
]
Neugebauer, Helmut
[1
]
Sariciftci, N. Serdar
[1
]
机构:
[1] Johannes Kepler Univ Linz, Linz Inst Organ Solar Cells LIOS, A-4040 Linz, Austria
[2] Univ Turku, Lab Mat Chem & Chem Anal, Dept Chem, FI-20014 Turku, Finland
[3] Univ Turku, Turku Univ Ctr Mat & Surfaces MATSURF, FI-20014 Turku, Finland
基金:
芬兰科学院;
关键词:
Electrochemical doping;
Pentacene;
Gold-pentacene interface;
Contact barrier;
Metal-p-i junction;
THIN-FILM TRANSISTORS;
RESISTANCE;
PENTACENE;
PHOTOEMISSION;
INTERFACE;
D O I:
10.1016/j.orgel.2012.03.020
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
By electrochemically p-doping pentacene in the vicinity of the source-drain electrodes in organic field effect transistors the injection barrier for holes is decreased. The focus of this work is put on the influence of the p-doping process on the transistor performance. Cyclic voltammetry performed on a pentacene based transistor exhibits a reversible p-doping response. This doped state is evoked at the transistor injection electrodes. An improvement is observed when comparing transistor characteristics before and after the doping process apparent by an improved transistor on-current. This effect is reflected in the analysis of the contact resistances of the devices. (C) 2012 Elsevier B.V. All rights reserved.
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页码:1296 / 1301
页数:6
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