Spatial distributions of near-band-gap UV and yellow emission on MOCVD grown GaN epifilms

被引:20
|
作者
Tu, LW [1 ]
Lee, YC
Stocker, D
Schubert, EF
机构
[1] Natl Sun Yat Sen Univ, Dept Phys, Kaohsiung 80424, Taiwan
[2] Boston Univ, Dept Elect & Comp Engn, Photon Res Ctr, Boston, MA 02215 USA
关键词
D O I
10.1103/PhysRevB.58.10696
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Near-band-gap UV and yellow band emission from metal-organic chemical vapor deposition grown GaN films on sapphires are investigated under laser excitation. The intensities of the UV and the yellow peaks increase at different rates as the entrance slit width of the spectrometer increases. The spatial distribution of the luminescence emission is analyzed through the dependence of photoluminescence intensity on the slit widths of the spectrometer. The yellow emission originates from a spot with a size about 1.5 times larger in diameter than the UV emission. Using an absorption mechanism, a Lorentzian line-shape distribution ft with the data gives estimated effective absorption coefficients of 47 cm(-1) for the UV signal at 364 nm and of 32 cm(-1) for the yellow signal at 546 nm, which agrees perfectly with the ones from an exponential decay fit. Dependence of UV-to-yellow peak ratio on the slit widths of the spectrometer, and consistence with possible origins of yellow luminescence is discussed. [SO163-1829(98)03132-4].
引用
收藏
页码:10696 / 10699
页数:4
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