3D Optical Laser Lithography

被引：1
|
作者：
Wegener, Martin [1 ,2 ]
机构：
[1] Karlsruhe Inst Technol, Inst Appl Phys, D-76128 Karlsruhe, Germany
[2] Karlsruhe Inst Technol, Inst Nanotechnol, D-76128 Karlsruhe, Germany
来源：
NANO-OPTICS: PRINCIPLES ENABLING BASIC RESEARCH AND APPLICATIONS | 2017年
关键词：
INVISIBILITY CLOAK; WAVELENGTHS;
D O I：
10.1007/978-94-024-0850-8_5
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
We very briefly review our recent progress regarding three-dimensional (3D) optical laser lithography or " 3D direct laser writing (DLW)". We focus on approaches inspired by 3D stimulated-emission depletion (STED) to break the diffraction barrier, on 3D dip-in DLW to obtain very tall structures with fine features, and on galvo-scanner based 3D DLW to increase the writing speed by two orders of magnitude.
引用
收藏
页码：143 / 148
页数：6
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