Ambient gas dependence of hydrogenated silicon clusters grown in an ion trap

被引:4
|
作者
Watanabe, MO
Kawashima, N
Kanayama, T
机构
[1] Joint Res Ctr Atom Technol, Angstrom Technol Partnership, Tsukuba, Ibaraki 3050046, Japan
[2] Joint Res Ctr Atom Technol, Natl Inst Adv Interdisciplinary Res, Tsukuba, Ibaraki 3058562, Japan
[3] Electrotech Lab, Tsukuba, Ibaraki 3058568, Japan
关键词
D O I
10.1088/0022-3727/31/18/002
中图分类号
O59 [应用物理学];
学科分类号
摘要
Hydrogenated Si cluster ions have been grown from silane gas under electron irradiation in an ion trap with five different gases, H-2, He, Ne, Ar and Xe, as ambient. The mass spectra of Si6Hx+ always had three peaks corresponding to x = 1, 7 and 13, but their peak heights varied depending on the ionization energy of the ambient gas except that Hp produced an exceptionally large amount of Si6Hx+. This dependence was attributed to the ability of the ambient gas to dissociate SiH4 to form SiH2 reactant, which is essential to the growth of Si6Hx+.
引用
收藏
页码:L63 / L66
页数:4
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