Ambient gas dependence of hydrogenated silicon clusters grown in an ion trap

被引:4
|
作者
Watanabe, MO
Kawashima, N
Kanayama, T
机构
[1] Joint Res Ctr Atom Technol, Angstrom Technol Partnership, Tsukuba, Ibaraki 3050046, Japan
[2] Joint Res Ctr Atom Technol, Natl Inst Adv Interdisciplinary Res, Tsukuba, Ibaraki 3058562, Japan
[3] Electrotech Lab, Tsukuba, Ibaraki 3058568, Japan
关键词
D O I
10.1088/0022-3727/31/18/002
中图分类号
O59 [应用物理学];
学科分类号
摘要
Hydrogenated Si cluster ions have been grown from silane gas under electron irradiation in an ion trap with five different gases, H-2, He, Ne, Ar and Xe, as ambient. The mass spectra of Si6Hx+ always had three peaks corresponding to x = 1, 7 and 13, but their peak heights varied depending on the ionization energy of the ambient gas except that Hp produced an exceptionally large amount of Si6Hx+. This dependence was attributed to the ability of the ambient gas to dissociate SiH4 to form SiH2 reactant, which is essential to the growth of Si6Hx+.
引用
收藏
页码:L63 / L66
页数:4
相关论文
共 50 条
  • [2] Growth of hydrogenated silicon cluster ions using an ion trap
    Hiura, H
    Kanayama, T
    CHEMICAL PHYSICS LETTERS, 2000, 328 (4-6) : 409 - 414
  • [3] GROWTH OF HYDROGENATED SI CLUSTERS USING A QUADRUPOLE ION-TRAP
    MURAKAMI, H
    KANAYAMA, T
    APPLIED PHYSICS LETTERS, 1995, 67 (16) : 2341 - 2343
  • [4] Formation of hydrogenated boron clusters in an external quadrupole static attraction ion trap
    Ohishi, Yuji
    Kimura, Kaoru
    Yamaguchi, Masaaki
    Uchida, Noriyuki
    Kanayama, Toshihiko
    JOURNAL OF CHEMICAL PHYSICS, 2008, 128 (12):
  • [5] Simulation of hydrogenated amorphous silicon: temperature dependence of nonequilibrium distribution functions for trap states
    Azuma Suzuki
    Journal of Computational Electronics, 2021, 20 : 1471 - 1483
  • [6] Simulation of hydrogenated amorphous silicon: temperature dependence of nonequilibrium distribution functions for trap states
    Suzuki, Azuma
    JOURNAL OF COMPUTATIONAL ELECTRONICS, 2021, 20 (04) : 1471 - 1483
  • [7] Structure of hydrogenated silicon clusters. Small clusters
    Meleshko, VP
    Morokov, YN
    Shveigert, VA
    JOURNAL OF STRUCTURAL CHEMISTRY, 1999, 40 (01) : 10 - 15
  • [8] Structure of hydrogenated silicon clusters. Small clusters
    V. P. Meleshko
    Yu. N. Morokov
    V. A. Shveigert
    Journal of Structural Chemistry, 1999, 40 : 10 - 15
  • [9] Light-intensity and temperature dependence of trap-dangling bond recombination in hydrogenated microcrystalline silicon
    Boehme, C
    Lips, K
    AMORPHOUS AND HETEROGENEOUS SILICON-BASED FILMS-2002, 2002, 715 : 309 - 314
  • [10] Gas phase ion chemistry of gold-silicon clusters
    Cao, Yali
    Hoeckendorf, Robert F.
    Beyer, Martin K.
    CHEMPHYSCHEM, 2008, 9 (10) : 1383 - 1386