A technique for producing ordered arrays of metallic nanoclusters by electroless deposition in focused ion beam patterns

被引：11
|
作者：
Weller, RA
Ryle, WT
Newton, AT
McMahon, MD
Miller, TM
Magruder, RH
机构：
[1] Vanderbilt Univ, Dept Elect Engn & Comp Sci, Nashville, TN 37235 USA
[2] Western Kentucky Univ, Bowling Green, KY 42101 USA
[3] Vanderbilt Univ, Dept Biomed Engn, Nashville, TN 37235 USA
[4] Vanderbilt Univ, Dept Phys, Nashville, TN 37235 USA
[5] Vanderbilt Univ, Dept Mech Engn, Nashville, TN 37235 USA
[6] NASA, Goddard Space Flight Ctr, Greenbelt, MD 20771 USA
[7] Belmont Univ, Dept Phys, Nashville, TN 37212 USA
来源：
IEEE TRANSACTIONS ON NANOTECHNOLOGY | 2003年 / 2卷 / 03期
关键词：
electroless deposition; focused ion beam; nanocrystal arrays; nanotechnology;
D O I：
10.1109/TNANO.2003.817528
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Ordered arrays of An nanoclusters have been prepared on Si substrates using a combination of focused ion beam (FIB) surface processing and electroless deposition. Particles varying in size from approximately 30 to 100 nm have been produced in regular grid patterns whose geometry is controlled to high precision by the FIB. Potential applications range from engineering of the surface plasmon resonance for numerous optical applications to building structures for tethering organic molecules in specific geometric arrangements.
引用
收藏
页码：154 / 157
页数：4
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