Quantum-wire effects in trigate SOI MOSFETs

被引:36
|
作者
Colinge, Jean-Pierre [2 ]
机构
[1] Univ Calif Davis, Dept Elect & Comp Engn, Davis, CA 95616 USA
[2] Univ Ireland Univ Coll Cork, Tyndall Natl Inst, Cork, Ireland
基金
爱尔兰科学基金会;
关键词
SOI; silicon-on-insulator; MOSFET;
D O I
10.1016/j.sse.2007.07.019
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Trigate SOI transistors have been modeled using the Poisson and Schrodinger equations. In devices with a large enough cross section, inversion channels form at the Si/SiO2 interfaces, but in devices with a small section, volume inversion is clearly visible. A transition between a one-dimensional density of states to a two-dimensional density of states is observed when the height of the fin is increased. Current oscillations are experimentally observed when the gate voltage is increased. These are due to a quantum-wire effect in which electron mobility is affected by intersubband scattering. (c) 2007 Elsevier Ltd. All rights reserved.
引用
收藏
页码:1153 / 1160
页数:8
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