Investigation on Tin Electrodeposition from Sulphuric Acid Medium

被引:0
|
作者
Bakkali, S. [1 ,2 ]
Cherkaoui, M. [2 ]
Warad, I [3 ]
Zarrouk, A. [4 ]
机构
[1] Univ Cadi Ayyad, Lab Chim Analyt & Mol LCAM, Fac Polydisciplinaire, BP 4162, Safi 000, Morocco
[2] Univ Ibn Tofail, Lab Mat Electrochim & Environm, Fac Sci, Kenitra 14000, Morocco
[3] Qatar Univ, Dept Chem & Earth Sci, POB 2713, Doha, Qatar
[4] Mohammed V Univ Rabat, Lab Mat Nanotechnol & Environm, Fac Sci, POB 1014, Rabat, Morocco
来源
关键词
Tin electrodeposition; Sulphuric acid; Voltammetry; Chronoamperometry; SEM; COPPER ELECTRODEPOSITION; NUCLEATION MECHANISMS; CURRENT-DENSITY; REDUCTION; CHLORIDE; PERFORMANCE; BATTERY;
D O I
暂无
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The tin electrodeposition in an acidic sulphate solution is reported. Electrochemical techniques (chronoamperometry, cyclic and linear voltammetry) are used to find out some kinetic parameters that govern the tin electrodeposition process while scanning electron microscopy (SEM) is used to explore the morphology of the coating. The influence on the tin electrodeposition of certain experimental parameters such as tin ion concentration, potential scan rate and deposition current density are described. Sharifker-Hills and Palomar Pardave models are used to investigate the nucleation process of tin. It is found that the tin and proton reductions occur simultaneously. Dimensionless current-time transient related only to the tin reduction reaction fits well the theoretical transient for instantaneous mechanism nucleation. The diffusion coefficient has been determined by various electrochemical techniques and is found to be between 6.24x10(-6) and 7.4x10(-6) cm(2)s(-1). i(0) the exchange current density value is 0.0023 A/cm(2) and the charge transfer coefficient alpha(c) is approximately 0.5. It is also noted that the deposition current density affects the morphology of the deposited tin.
引用
收藏
页码:160 / 175
页数:16
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