NCFET: Opportunities & Challenges for Advanced Technology Nodes

被引:0
|
作者
Krivokapic, Zoran [1 ]
Aziz, Ahmedullah [1 ]
Song, Da [1 ]
Rana, Uzma [1 ]
Galatage, Rohit [1 ]
Banna, Srinivasa [1 ]
机构
[1] GLOBALFOUNDRIES, Santa Clara, CA 95054 USA
关键词
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
下载
收藏
页数:3
相关论文
共 50 条
  • [1] NCFET to Rescue Technology Scaling: Opportunities and Challenges
    Amrouch, Hussam
    van Santen, Victor M.
    Pahwa, Girish
    Chauhan, Yogesh
    Henkel, Joerg
    2020 25TH ASIA AND SOUTH PACIFIC DESIGN AUTOMATION CONFERENCE, ASP-DAC 2020, 2020, : 637 - 644
  • [2] CMP Challenges for Advanced Technology Nodes
    John H. Zhang
    Haigou Huang
    Andrew M. Greene
    Ruilong Xie
    Soon-Cheon Seo
    Pietro Montanini
    Wei-Tsu Tseng
    Stan Tsai
    Matthew Malley
    Qiang Fang
    Raghuveer Patlolla
    Dinesh Koli
    Dechao Guo
    Donald F. Canaperi
    Charan Surisetty
    Jean E. Wynne
    Walter Kleemeier
    Cathy Labelle
    MRS Advances, 2017, 2 (44) : 2361 - 2372
  • [3] Advanced IC technology - Opportunities and challenges
    Anis, Mohab
    PROCEEDINGS OF 2008 IEEE INTERNATIONAL SYMPOSIUM ON CIRCUITS AND SYSTEMS, VOLS 1-10, 2008, : 776 - 779
  • [4] PANEL: EDA Challenges at Advanced Technology Nodes A
    Liu, Eugene
    PROCEEDINGS OF THE 2024 INTERNATIONAL SYMPOSIUM ON PHYSICAL DESIGN, ISPD 2024, 2024, : 67 - 67
  • [5] CPI Challenges in Advanced Si Technology Nodes
    Liu, C. S.
    Pu, H. P.
    Chen, C. S.
    Tsai, H. Y.
    Lee, C. H.
    Lii, M. J.
    Yu, Doug C. H.
    PROCEEDINGS OF THE 2013 IEEE INTERNATIONAL INTERCONNECT TECHNOLOGY CONFERENCE (IITC), 2013,
  • [6] Cleaning Challenges and Solutions for Advanced Technology Nodes
    Mertens, P. W.
    Vos, R.
    Masayuki, W.
    Arnauts, S.
    Takahashi, H.
    Tsvetanova, D.
    Cuypers, D.
    Sioncke, S.
    Valckx, N.
    Brems, S.
    Hauptmann, M.
    Heyns, M.
    SEMICONDUCTOR CLEANING SCIENCE AND TECHNOLOGY 12 (SCST 12), 2011, 41 (05): : 3 - 13
  • [7] PANEL: EDA Challenges at Advanced Technology Nodes B
    Liao, Guang-Wan
    PROCEEDINGS OF THE 2024 INTERNATIONAL SYMPOSIUM ON PHYSICAL DESIGN, ISPD 2024, 2024, : 69 - 69
  • [8] PANEL: EDA Challenges at Advanced Technology Nodes C
    Chang, Keh-Jeng
    PROCEEDINGS OF THE 2024 INTERNATIONAL SYMPOSIUM ON PHYSICAL DESIGN, ISPD 2024, 2024, : 73 - 73
  • [9] CMP Challenges for Advanced Technology Nodes beyond Si
    John H Zhang
    Stan Tsai
    Charan Surisetty
    Jody Fronheiser
    Shariq Siddiqui
    Steven Bentley
    Raghuveer Patlolla
    Donald F. Canaperi
    Walter Kleemeier
    Cathy Labelle
    MRS Advances, 2017, 2 (51) : 2891 - 2902
  • [10] Introduction to the Panel on EDA Challenges at Advanced Technology Nodes
    Chen, Tung-Chieh
    PROCEEDINGS OF THE 2024 INTERNATIONAL SYMPOSIUM ON PHYSICAL DESIGN, ISPD 2024, 2024, : 61 - 61