Direct imaging method of frequency response of capacitance in dual bias modulation electrostatic force microscopy

被引:5
|
作者
Fukuzawa, Ryota [1 ]
Takahashi, Takuji [1 ,2 ]
机构
[1] Univ Tokyo, Inst Ind Sci, Meguro Ku, Tokyo 1538505, Japan
[2] Univ Tokyo, Inst Nano Quantum Informat Elect, Meguro Ku, Tokyo 1538505, Japan
关键词
Electric force microscopy - Electrostatic devices - Electrostatic force - Modulation - Frequency response;
D O I
10.35848/1347-4065/ab9ae0
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have proposed and demonstrated a direct imaging method in dual bias modulation electrostatic force microscopy (DI-DEFM) to observe the frequency response of the capacitance between a conductive tip and a sample in a single scan. In DI-DEFM, dual ac biases with different frequencies (f(1), f(2)) are simultaneously applied between the tip and the sample to generate an electrostatic force; the frequencies are switched between two pairs of frequency conditions, with a switching frequency f(m). Then, the f(2) - 2f(1) - f(m) component in the electrostatic force is detected, similar to a heterodyne method, to analyze the frequency response of the capacitance. The validity of DI-DEFM is assessed through the image acquisition on a Cu(In,Ga)Se-2 sample. (C) 2020 The Japan Society of Applied Physics
引用
收藏
页数:4
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