Formation of self-organized Ta nano-structures by argon ion sputtering of Ta foil: XPS and AFM study

被引：30

作者：

Medicherla, V. R. R. ^{[1
]}

Majumder, S. ^{[1
]}

Paramanik, D. ^{[1
]}

Varma, Shikha ^{[1
]}

机构：

[1] Inst Phys, Bhubaneswar 751005, Orissa, India

来源：

JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA | 2010年 / 180卷 / 1-3期

关键词：

Nano-structures; High dielectric oxides; Ion sputtering; XPS; Surface core level; AFM; Surface morphology; COMPOSITIONAL CHANGES; RIPPLE TOPOGRAPHY; THIN-FILMS; BOMBARDMENT; SURFACES; TA2O5; BEAM; TANTALUM; PARAMETERS; NANOSCALE;

D O I：

10.1016/j.elspec.2010.02.006

中图分类号：

O433 [光谱学];

学科分类号：

0703 ; 070302 ;

摘要：

The nano-structured Ta has been prepared by 3 keV argon ion sputtering of the Ta foil. The XPS and AFM studies were carried out on samples sputtered for fluences ranging from 6.0x10(15) to 3.6x10(16) ions/cm(2). The sample sputtered at lowest fluence showed the formation of dimples along with mild ripples which disappeared on further sputtering. After prolonged sputtering, clear ripple formation has been observed with a wave length of about 80 nm. Our XPS results indicated that Ta 4f of the Ta liberated after sputtering is shifted to higher binding energy by 0.5 eV. The Ta(2)O(5) completely disappeared after prolonged sputtering for 60 min, but little amount of sub-Ta oxide (TaO(x)) is still seen. (C) 2010 Elsevier B.V. All rights reserved.

引用

页码：1 / 5

页数：5

共 21 条

[1] Self-organized nanopatterning of polycarbonate surfaces by argon ion sputtering
Goyal, Meetika
Gupta, Divya
Aggarwal, Sanjeev
Sharma, Annu
[J]. JOURNAL OF PHYSICS-CONDENSED MATTER, 2018, 30 (28)
[2] Self-organized nanodot formation on InP(100) by argon ion sputtering at normal incidence
Tan, S. K.
Wee, A. T. S.
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2006, 24 (03): : 1444 - 1448
[3] Self-organized quantum dot formation by ion sputtering
Facsko, S
Dekorsy, T
Trappe, C
Kurz, H
[J]. MICROELECTRONIC ENGINEERING, 2000, 53 (1-4) : 245 - 248
[4] Is Sputtering Relevant For Ion-Induced Self-Organized Pattern Formation?
Hofsaess, Hans
Bobes, Omar
Zhang, Kun
[J]. APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, 2013, 1525 : 386 - 391
[5] Self-organized nanodot formation on InP(100) by oxygen ion sputtering
Tan, S. K.
Liu, R.
Sow, C. H.
Wee, A. T. S.
[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2006, 248 (01): : 83 - 89
[6] Formation of self-organized nanostructures on Ge during focused ion beam sputtering
Zhou, W
Cuenat, A
Aziz, MJ
[J]. MICROSCOPY OF SEMICONDUCTING MATERIALS 2003, 2003, (180): : 625 - 628
[7] Molybdenum assisted self-organized pattern formation by low energy ion beam sputtering
Navin, Kumar
Gupta, Ajay
Vayalil, Sarathlal Koyiloth
[J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2024, 130 (05):
[8] Single crystal aluminum deposit formation on isotropic substrates by means of self-organized ion sputtering
V. I. Perekrestov
A. S. Kornyushchenko
Yu. A. Kosminskaya
[J]. Technical Physics Letters, 2006, 32 : 868 - 870
[9] Single crystal aluminum deposit formation on isotropic substrates by means of self-organized ion sputtering
Perekrestov, V. I.
Kornyushchenko, A. S.
Kosminskaya, Yu. A.
[J]. TECHNICAL PHYSICS LETTERS, 2006, 32 (10) : 868 - 870
[10] Kinetic Monte Carlo simulations of self organized nanostructures on Ta surface fabricated by low energy ion sputtering
Joshi, Shalik Ram
Bagarti, Trilochan
Varma, Shikha
[J]. SURFACE SCIENCE, 2015, 641 : 170 - 173

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