The Wettability and Diffusion of Al Droplets on the C- and Si-Terminated 4H-SiC Surfaces: A Classic Molecular Dynamics Study

被引:5
|
作者
Lv, Yi [1 ,2 ]
Liao, Feng [1 ]
Peng, Chengcheng [1 ]
Liu, Sheng [3 ]
机构
[1] Hubei Univ Arts & Sci, Sch Mech Engn, Xiangyang, Peoples R China
[2] Longzhong Lab, Wuhan, Hubei, Peoples R China
[3] Wuhan Univ, Inst Technol Sci, Wuhan, Peoples R China
关键词
Molten Al droplet; contact angle; wettability; 4H-SiC; surface polarity; ALUMINUM; COMPOSITES;
D O I
10.1007/s11664-022-09921-z
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Unique physical characteristics make AlSiC an important packaging material for power electronics devices such as insulated-gate bipolar transistors (IGBTs). In the present study, we performed classical molecular dynamics simulations to investigate the effect of the 4H-SiC surface termination characteristics on the wettability of molten Al droplets. This result has considerable significance for improving the wettability between a matrix and reinforcing particles, which is required to prepare AlSiC composites by the casting method. Density profile analysis was adopted to calculate the contact angles theta of Al droplets on a surface of SiC, including Si- and C-terminated surfaces. The calculated angles theta were 99.8 degrees and 81.7 degrees, respectively. The stratification of the droplet density in the C-terminated system depended strongly on the terminated characteristics of the SiC surface and helped increase the wettability of droplets in this system. In addition, droplet diffusion on the Si-terminated surface was obviously slower than that on the C-terminated surface. The wetting characteristic of molten Al droplets depended strongly on the interaction energy, indicating that the surface terminated characteristics had a strong effect on the wettability of the SiC surface. Compared to the results for the Si-terminated surface, the molten Al droplet had a considerably smaller contact angle and the C-terminated surface showed a higher wettability.
引用
收藏
页码:6921 / 6929
页数:9
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