Field and temperature dependence of thermally activated flux flow resistance in Tl2Ba2CaCu2O8 thin films

被引：6
|
作者：
Lu, XF
Gao, H
Wang, Z
Zhang, YZ
Shan, L
Lu, RT
Yan, SL
Wen, HH
机构：
[1] Chinese Acad Sci, Inst Phys, Natl Lab Superconductiv, Beijing 100080, Peoples R China
[2] Nankai Univ, Dept Elect, Tianjin 300071, Peoples R China
来源：
PHYSICA C-SUPERCONDUCTIVITY AND ITS APPLICATIONS | 2005年 / 423卷 / 3-4期
基金：
中国国家自然科学基金;
关键词：
activation energy; thermally activated flux flow resistance;
D O I：
10.1016/j.physc.2005.04.014
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
The field and temperature dependence of thermally activated flux flow (TAFF) resistance in Tl2Ba2CaCU2O8 thin films (one film being c-axis-oriented and the other 20 degrees tilted from c-axis) has been measured. By analyzing the broadening of the resistive transition with the TAFF model, we get the field and temperature dependence of the activation energy U-c(T, H) for flux motion of both pancake and Josephson vortices, which is described by U-c(T, H) = A (1 - t)H-n with A a constant and t = T/T'(c)(T-c(') approximate to T-c). (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码：175 / 180
页数：6
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