Abnormal High Resistive State Current Mechanism Transformation in Ti/HfO2/TiN Resistive Random Access Memory

被引:11
|
作者
Zhou, Kuan-Ju [1 ]
Chang, Ting-Chang [1 ]
Lin, Chih-Yang [1 ]
Chen, Chun-Kuei [1 ]
Tseng, Yi-Ting [1 ]
Zheng, Hao-Xuan [1 ]
Chen, Hong-Chih [1 ]
Sun, Li-Chuan [2 ]
Lien, Chih-Ying [1 ]
Tan, Yung-Fang [2 ]
Wu, Chung-Wei [1 ]
Yeh, Yu-Hsuan [1 ]
Sze, Simon M. [3 ,4 ]
机构
[1] Natl Sun Yat Sen Univ, Dept Phys, Kaohsiung 80424, Taiwan
[2] Natl Sun Yat Sen Univ, Dept Mat & Optoelect Sci, Kaohsiung 80424, Taiwan
[3] Natl Chiao Tung Univ, Dept Elect Engn, Hsinchu 300, Taiwan
[4] Natl Chiao Tung Univ, Inst Elect, Hsinchu 300, Taiwan
关键词
Titanium; Hafnium oxide; Schottky thermal emission; hopping conduction; TIO2;
D O I
10.1109/LED.2019.2961408
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this letter, the electrical characteristics of Ti/HfO2/TiN resistive random access memory (RRAM) were thoroughly investigated. An abnormal current degradation was seen in the DC sweeping cycle. Both the on-state and off-state current clearly exhibited degradation with time. Next, current fitting analysis was used to investigate the carrier transport mechanisms. The results indicate that the on-state carrier transport mechanism changed from space-charge-limited current into hopping conduction after cycle sweeping. However, the off-state current changes from Schottky thermal emission to hopping conduction. Based on comparisons of different Schottky distances and Schottky barriers, physical models were proposed to explain the abnormal current degradation behavior. Finally, COMSOL electric field simulations were used to show the electric field distribution around the conducting filament (CF), and the conducting model was subsequently verified.
引用
收藏
页码:224 / 227
页数:4
相关论文
共 50 条
  • [1] Barrier Potential Engineering in Ti/HfO2/Pt Resistive Random Access Memory
    Kumar, S. Sachin
    Sahu, Paritosh Piyush
    Panda, Debashis
    [J]. JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2017, 17 (12) : 9328 - 9332
  • [2] Electric characteristics and resistive switching mechanism of Ni/HfO2/Pt resistive random access memory cell
    Pang Hua
    Deng Ning
    [J]. ACTA PHYSICA SINICA, 2014, 63 (14)
  • [3] Heavy Ion Radiation Effects on TiN/HfO2/W Resistive Random Access Memory
    He, Xiaoli
    Geer, Robert E.
    [J]. 2013 IEEE AEROSPACE CONFERENCE, 2013,
  • [4] Investigation of Radiation Hardness of HfO2 Resistive Random Access Memory
    Tsui, Bing-Yue
    Chang, Ko-Chin
    Shew, Bor-Yuan
    Lee, Heng-Yuan
    Tsai, Ming-Jinn
    [J]. PROCEEDINGS OF TECHNICAL PROGRAM - 2014 INTERNATIONAL SYMPOSIUM ON VLSI TECHNOLOGY, SYSTEMS AND APPLICATION (VLSI-TSA), 2014,
  • [5] Grain boundaries as preferential sites for resistive switching in the HfO2 resistive random access memory structures
    Lanza, M.
    Zhang, K.
    Porti, M.
    Nafria, M.
    Shen, Z. Y.
    Liu, L. F.
    Kang, J. F.
    Gilmer, D.
    Bersuker, G.
    [J]. APPLIED PHYSICS LETTERS, 2012, 100 (12)
  • [6] Enhanced resistive switching performance for bilayer HfO2/TiO2 resistive random access memory
    Ye, Cong
    Deng, Tengfei
    Zhang, Junchi
    Shen, Liangping
    He, Pin
    Wei, Wei
    Wang, Hao
    [J]. SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2016, 31 (10)
  • [7] Hf layer thickness dependence of resistive switching characteristics of Ti/Hf/HfO2/Au resistive random access memory device
    Nakajima, Ryo
    Azuma, Atsushi
    Yoshida, Hayato
    Shimizu, Tomohiro
    Ito, Takeshi
    Shingubara, Shoso
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 2018, 57 (06)
  • [8] Optimization of Bilayer Resistive Random Access Memory Based on Ti/HfO2/ZrO2/Pt
    Sun, Zhendong
    Wang, Pengfei
    Li, Xuemei
    Chen, Lijia
    Yang, Ying
    Wang, Chunxia
    [J]. MATERIALS, 2024, 17 (08)
  • [9] Investigation of HfO2 and ZrO2 for Resistive Random Access Memory applications
    Salauen, A.
    Grampeix, H.
    Buckley, J.
    Mannequin, C.
    Vallee, C.
    Gonon, P.
    Jeannot, S.
    Gaumer, C.
    Gros-Jean, M.
    Jousseaume, V.
    [J]. THIN SOLID FILMS, 2012, 525 : 20 - 27
  • [10] Total Ionizing Dose Effects on TiN/Ti/HfO2/TiN Resistive Random Access Memory Studied via Electrically Detected Magnetic Resonance
    Mccrory, D. J.
    Lenahan, P. M.
    Nminibapiel, D. M.
    Veksler, D.
    Ryan, J. T.
    Campbell, J. P.
    [J]. IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2018, 65 (05) : 1101 - 1107